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Instruments

The E. M. Facility is equipped with transmission and scanning electron microscopes, a scanned probe microscope, and ancillary equipment.

Instrument Scheduling

JEOL JEM 1010 transmission electron microscope.

• 40 KV to 100KV TEM
• Side entry goniometer stage, two specimens
• Tilt to +/- 60º
• High contrast objective (FL=5mm)
• Point resolution = 0.45nm, Lattice resolution = 0.2nm
• Bright and dark field imaging
• Selected area and microbeam diffraction
• Gatan cold trap and Gatan Bioscan CCD camera.
• Gatan Cryo-transfer system
• User notes for JEOL 1010

 

 

 

FEI Company Tecnai F20 FEG TEM (field emission gun transmission electron microscope).

• 80 KV to 200 KV TEM
• Schottky Field emitter
• High maximum beam current (> 100 nA)
• High current in probe (0.5 nA or more in 1 nm probe)
• Small energy spread (0.7 eV or less)
• Point resolution = 0.24nm, Lattice resolution = 0.1nm
• High resolution objective lens FL = 1.7mm
• High tilt (40º) and large field of view
• Fully computer-controlled, eucentric side-entry, high-stability CompuStage
• Maximized tilts for any X, Y, Z, a, b combination
• Low-background double-tilt holder
• Drift < 0.5 nm/minute with a standard hold
• AMT CCD digital camera system (upper mount for wide field imaging). V
• Integrated EDAX Si(Li) 30mm² Super Ultra Thin Window detector (136ev resolution).
• User Notes for Tecnai F20

 

FEI Company, XL-30 ESEM-FEG (field emission gun environmental scanning electron microscope).

• Field emission gun environmental SEM - High brightness, very small spot size. 0.2 - 30 KV.
• Resolution: 2nm @ 30KV in high vacuum or 10mBar water vapor, 5 nm @1 KV.
• Gaseous SE and BSE detectors for low vacuum imaging.
• Viewing of uncoated samples due to charge neutralization in low vacuum mode.
• Pressures to 10 Torr - hydrated samples are stable in environmental chamber with Peltier-cooled stage (to -20º from ambient).
• Stage automation (X, Y, Z, rotation). Tilt from -15º to +75º.
• TV scan rate plus 4 user preset slow scan speeds.
• HKL, Inc. EBSD system with new digital detector system. Details of an older system we built are given on the EBSP page.
• X-ray microanalysis with Edax light element Si(Li) detector.
• Nabity direct write E-beam lithography system.
• User Notes for XL-30 and attachments.

 

WITEC CRM200 CONFOCAL RAMAN MICROSCOPE

• high resolution 2D Raman Imaging at fixed wavenumbers ,
• x-y, x-z, y-z scans (up 1024 x 1024 pixels)
• acquisition of complete Raman spectra at every pixel (mapping)
• acquisition of Raman spectra at selected areas
• confocal microscopy in reflection
• confocal fluorescence imaging
• Scanning Unit piezo-driven scan platform, scan range 200 x 200 x 20 µm, with integrated capacitive sensors and closed-loop hardware linearization, linearity 0.03 %
• Position Accuracy < 4 nm in x-y- and < 1 nm in z-direction
• Sample Positioning x-y translation stage, with 20 x 20 mm travel, resolution < 1 µm
• Optical Resolution diffraction limited, lateral typ. 200 nm @ 514nm excitation wavelength
• Spectrograph f/4, 300 mm imaging spectrograph with 2 exit ports and 3 gratings (150, 600, 1800 lines/mm)
• Detector Avalanche Photodiode Detector (APD) in single photon counting mode, darkcounts/s < 100, 70% QE @ 633 nm (typ.)
• CCD-Camera thermoelectrically cooled CCD (Peltier cooler), 1340 x 100 pixel format, scientific grade CCD chip, 16bit camera controller, 100 kHz A/D Converter
• User notes for WITec CRM200.

 

OPC-60 Osmium Plasma Coater.

• Provides 1 to 10 nm amorphous Osmium coating.
• Automatic process runs.
• User Notes for OPC-60.

 

Veeco/Digital Instruments SCANNING PROBE MICROSCOPE.

• Nanoscope IV controller electronics
• MultiMode SPM, and a Dimension 3100 SPM.
• Atomic Force Microscopy in both contact and tapping mode
• Phase, Lateral Force, etc.
• Magnetic Force Microscopy
• Kelvin Force Microscopy (MM)
• Scanning Tunneling Microscopy (MM).
• Accessories include a fluid cell for the Dimension 3100 and a heating system for the MultiMode.
• User Notes for Veeco SPM.

 

Hysitron Ubi-1 Scanning Quasi-static Nanoindenter

• Quasi-static Testing- Measure Young's modulus, hardness, fracture toughness and other
• ScanningWear- Observe and quantify wear volumes and wear rates using in-situ imaging capability.
• Feedback Control- Operate in closed loop load or displacement control for testing techniques such as creep and stress relaxation.
• Piezo Automation- Automated indentation using predetermined patterns or Click Mode allows faster data collection with less operator time.
• Motorized Staging- Automated indentation across large areas on a single sample or between multiple samples increases efficiency and decreases user intervention.
• Active Vibration Isolation- Piezoelectric driven active vibration dampening from 0.7 to 1000Hz for faster stabilization time and optimum results.
• User Notes for Ubi-1.

OTHER INSTRUMENTS. The E.M. Lab has a variety of other instruments for light microscopy, image analysis and processing and specimen preparation. These are briefly described here.